JOURNAL PAPER

Monte Carlo simulation of Pt-Al thin film diffusion

R.A. Harris^I; J.J. Terblans^I; H.C. Swart^II; E. van der Lingen^II

^IDepartment of Physics,University of the Free State
^IIAdvanced Materials Division, Mintek

SYNOPSIS

In this study Pt-Al thin films were prepared via electron beam physical vapour deposition (EB-PVD) with an atomic concentration ratio of Pt25:Al75. These films were heat treated at temperatures ranging from 150°C to 650°C for annealing times from 4 to 60 minutes. The resulting microstructure of these thin films were obtained via secondary electron imaging used in conjunction with depth profiling with the aid of scanning auger microscopy (PHI 700). Elemental maps of the micrographs were obtained. Simulations, based on a chemical potential Monte Carlo method1, were run for various interaction parameters. From these simulations theoretical depth-profiles and proposed microstructures were obtained. These were compared to the experimentally measured depth profiles and elemental maps.

Keywords: Monte Carlo, chemical potential, depth profile, Pt-Al thin films

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References

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