South African Journal of Science
versión On-line ISSN 1996-7489
versión impresa ISSN 0038-2353
MSOMI, V y NEMRAOUI, O. The influence of deposition temperature on vanadium dioxide thin films microstructure and physical properties. S. Afr. j. sci. [online]. 2010, vol.106, n.11-12, pp.1-4. ISSN 1996-7489. http://dx.doi.org/10.4102/sajs.v106i11/12.297.
Vanadium dioxide thin films were successfully prepared on soda lime glass substrates using the optimised conditions for r.f-inverted cylindrical magnetron sputtering. The optimised deposition parameters were fixed and then a systematic study of the effect of deposition temperature, ranging from 450 ºC to 550 ºC, on the microstructure of thermochromic thin films was carried out. The deposited films were found to be well crystallised, showing strong texture corresponding to the (011) plane, indicating the presence of vanadium dioxide.
Palabras clave : deposition temperature; microstructure; thermochromism; thin films; vanadium dioxide.