SciELO - Scientific Electronic Library Online

 
vol.106 número7-8The use of a genetic algorithm in optical thin film design and optimisationThe sex profile of skeletal remains from a cemetery of chinese indentured labourers in South Africa índice de autoresíndice de materiabúsqueda de artículos
Home Pagelista alfabética de revistas  

Servicios Personalizados

Articulo

Indicadores

Links relacionados

  • En proceso de indezaciónCitado por Google
  • En proceso de indezaciónSimilares en Google

Compartir


South African Journal of Science

versión On-line ISSN 1996-7489
versión impresa ISSN 0038-2353

Resumen

COVILLE, Neil J.  y  TSHAVHUNGWE, Alufelwi M.. Mesoporous ethanesilica materials with bimodal and trimodal pore-size distributions synthesised in the presence of cobalt ions. S. Afr. j. sci. [online]. 2010, vol.106, n.7-8, pp.1-5. ISSN 1996-7489.

Mesoporous organosilica materials containing ethane groups in their framework were formed with two and three pore sizes (i.e. bimodal and trimodal pores) when synthesised by the sol-gel method in the presence of cobalt ions. The compounds 1,2-bistrimethoxysilylethane and tetraethylorthosilicate were used as silicon sources and the reactions were done in the presence of a surfactant, which served as a template. Diffuse reflectance infrared Fourier transform spectroscopy revealed that organic functional groups were incorporated into the ethanesilica. Powder X-ray diffraction and nitrogen adsorption data indicated that the mesophase and textural properties (surface area, pore volume, pore diameter) of the materials were dependent on the ageing temperature, the amount/ratio of silica precursors and cobalt ion incorporation. Secondary mesopores were drastically reduced by changing the ratio of silicon precursors.

Palabras clave : cobalt; ethanesilica; mesoporous materials; porosity; sol-gel synthesis.

        · texto en Inglés     · Inglés ( pdf )

 

Creative Commons License Todo el contenido de esta revista, excepto dónde está identificado, está bajo una Licencia Creative Commons